aniani ʻālohilohi anti glare
ʻikepili ʻenehana
mānoanoa | mea maka | ka uhi ʻana | kalai kemika | ||||
luna | lalo | luna | lalo | luna | lalo | ||
0.7mm | 0.75 | 0.62 | 0.8 | 0.67 | 0.7 | 0.57 | |
1.1mm | 1.05 | 1.15 | 1.1 | 1.2 | 1 | 1.1 | |
1.5mm | 1.58 | 1.42 | 1.63 | 1.47 | 1.53 | 1.37 | |
2mm | 2.05 | 1.85 | 2.1 | 1.9 | 2 | 1.8 | |
3mm | 3.1 | 2.85 | 3.15 | 2.9 | 3.05 | 2.8 | |
4mm | 4.05 | 3.8 | 4.1 | 3.85 | 4 | 3.75 | |
5mm | 5.05 | 4.8 | 5.1 | 4.85 | 5 | 4.75 | |
6mm | 6.05 | 5.8 | 6.1 | 5.85 | 6 | 5.75 | |
ʻĀpana | ʻōlinolino | ʻoʻoleʻa | ʻohu | hoʻoili | noonoo ana | ||
35±10 | 0.16±0.02 | 17±2 | >89% | ~1% | |||
50±10 | 0.13±0.02 | 11±2 | >89% | ~1% | |||
70±10 | 0.09±0.02 | 6±1 | >89% | ~1% | |||
90±10 | 0.07±0.01 | 2.5±0.5 | >89% | ~1% | |||
110±10 | 0.05±0.01 | 1.5±0.5 | >89% | ~1% | |||
Ho'āʻo hopena | mānoanoa | ke kaumaha pōlele kila (g) | kiʻekiʻe (cm) | ||||
0.7mm | 130 | 35 | |||||
1.1mm | 130 | 50 | |||||
1.5mm | 130 | 60 | |||||
2mm | 270 | 50 | |||||
3mm | 540 | 60 | |||||
4mm | 540 | 80 | |||||
5mm | 1040 | 80 | |||||
6mm | 1040 | 100 | |||||
ʻoʻoleʻa | >7H | ||||||
| AG ka uhi ʻana | AG kiʻi kemika | |||||
ʻO ka hoʻāʻo anti corrsion | ʻO ka manaʻo o ka NaCL 5%: | N/A | |||||
ʻO ka hoʻāʻo kūpaʻa haʻahaʻa | 60 ℃, 90% RH, 48 hola | N/A | |||||
Hoʻāʻo abrasion | 0000#fsteel hulu hipa me 100ogf ,6000cycles,40cycles/min | N/A |
Kaʻina hana
ʻO ke aniani anti-glare, i kapa ʻia he aniani AG, he ʻano aniani me ka mālama kūikawā ma ka ʻili aniani.ʻO ke kumumanaʻo ka hana ʻana i ka overlay kiʻekiʻe ma nā ʻaoʻao hoʻokahi a i ʻole nā ʻaoʻao ʻelua i mea e haʻahaʻa ai ka nānā ʻana ma mua o ke aniani maʻamau, a laila e hōʻemi ana i ka interference o ke kukui ambient, hoʻomaikaʻi i ka mālamalama o ke kiʻi, hōʻemi i ka noʻonoʻo ʻana o ka pale, a hoʻomaʻemaʻe i ke kiʻi. ʻoi aku ka ʻoiaʻiʻo, hiki i ka poʻe nānā ke hauʻoli i nā hopena ʻike maikaʻi aʻe.
Hoʻokaʻawale ʻia ke kumu hana o ke aniani AG i AG physical spray coating a me AG chemical etching
1. AG e hoolei ana i ke aniani uhi
ʻO ia hoʻi, ma ke kaomi ʻana a i ʻole ka ikaika centrifugal, ua uhi like ʻia nā ʻāpana e like me ka sub-micron silica ma ka ʻili aniani ma o ka pū puhi a i ʻole ka disc atomizer, a ma hope o ka hoʻomehana ʻana a me ka mālama ʻana, ua hana ʻia kahi papa o nā ʻāpana ma ke aniani. ʻilikai.E hoʻomāhuahua i ka noʻonoʻo o ka mālamalama e loaʻa i ka hopena anti-glare
E like me ke kāpī ʻana i kahi uhi ma ka ʻili o ke aniani, no laila e ʻoi aku ka mānoanoa o ke aniani ma hope o ka uhi ʻana.
2. AG kemika etching aniani.
E pili ana ia i ka hoʻohana ʻana i nā hopena kemika. pono ia i nā mea kemika e like me ka waika hydrofluoric, ka waikawa hydrochloric, a me ka ʻakika sulfuric e hoʻopaʻa i ka ʻili aniani mai ka aniani a i ka matt me ka micron particle surface, ʻo ia ka hopena o ka hana hui o ka ionization equilibrium, kemika. ka hopena, ka hoʻoheheʻe ʻana a me ka recrystallization, ka pani ʻana o ka ion a me nā hopena ʻē aʻe.
E like me ke kālai ʻana i ka ʻili aniani, no laila e ʻoi aku ka lahilahi o ka mānoanoa aniani ma mua o ka wā ma mua.
No ka hana pale conductive a i ʻole EMI, hiki iā mākou ke hoʻohui i ka uhi ITO a i ʻole FTO.
No ka hoʻonā anti glare, hiki iā mākou ke hoʻohana i ka uhi anti glare e hoʻomaikaʻi i ka mana noʻonoʻo māmā.
No ka hoʻonā oleophobic, hiki ke hoʻopili i ka paʻi manamana limamaikaʻi loahui e hoʻomaikaʻi i ka manaʻo paʻi a hoʻomaʻemaʻe i ka pale paʻi.
aniani AG(anti glare) VS AR(anti reflective), he aha ka ʻokoʻa, ʻo wai ka maikaʻi.heluhelu hou