kev cai 1.1mm ito conductive iav

Nta:

Khoom siv: 1.1mm asahi iav

Loj: 214.8 * 95.8 * 1.1mm

CNC tshuab ntug

Tshuaj muaj zog

ITO txheej pem hauv ntej nto

Kuj: 40-60 ohm

High lub cev ntom ntom ntawm txheej

Siab ib puag ncig thiab kub stability

Zoo heev hluav taws xob conductivity thiab optical transparency

Thermally thiab chemically ruaj khov

Nug rau nqe lus

Product Detail

Khoom cim npe

Cov khoom Pics

ITO conductive coated iav yog tsim los ntawm kev sib kis ntawm silicon dioxide (SiO2) thiab indium tin oxide (feem ntau hu ua ITO) txheej los ntawm magnetron sputtering technology ntawm iav substrate nyob rau hauv tag nrho vacuumed mob, ua coated lub ntsej muag conductive, ITO yog ib tug hlau compound nrog zoo pob tshab thiab conductive zog.

Cov ntaub ntawv technical

ITO iav thickness	0.4 hli, 0.5 hli, 0.55 hli, 0.7 hli, 1 hli, 1.1 hli, 2 hli, 3 hli, 4 hli
tsis kam	3-5Ω	7-10Ω	12-18Ω	20-30Ω	30-50Ω	50-80Ω	60-120Ω	100-200Ω	200-500Ω
txheej thickness	2000-2200 Nws	1600-1700 Nws	1200-1300 Nws	650-750 Ib	350-450 Ib	200-300 Nws	150-250 Nws	100-150 Ib	30-100 Nws

iav tsis kam
Hom kev tiv thaiv	tsis muaj zog	ib txwm tsis kam	siab tsis kam
Txhais	<60Ω	60-150Ω	150-500Ω
Daim ntawv thov	Cov iav ua haujlwm siab feem ntau yog siv rau kev tiv thaiv electrostatic thiab kov npo ntau lawm	Ordinary kuj iav feem ntau yog siv rau TN hom kua siv lead ua zaub thiab hluav taws xob tiv thaiv kev cuam tshuam (EMI shielding)	Cov iav tsis tshua muaj siab yog feem ntau siv hauv STN kua siv lead ua cov lus qhia thiab pob tshab hauv pawg thawj coj saib

Kev xeem ua haujlwm thiab kev ntsuas kev ntseeg siab
Ua siab ntev	± 0.2 hli
Warpage	tuab＜0.55mm, warpage≤0.15% thickness＞0.7 hli, warpage≤0.15%
ZT ntsug	≤1°
Hardness	> 7 H
Coating Abrasion Test	0000 # steel wool nrog 1000gf,6000cycles, 40cycles / min
Anti corrsion test (kev kuaj ntsev tsuag)	NaCL concentration 5%:Kub: 35 ° CLub sij hawm sim: 5min kuj hloov ≤10%
Humidity resistance test	60℃,90% RH,48 teev tsis kam hloov ≤10%
Acid resistance test	HCL concentration: 6%, Kub: 35 ° CLub sij hawm sim: 5min kuj hloov ≤10%
Alkali resistance test	NaOH concentration: 10%, Kub: 60 ° CLub sij hawm sim: 5min kuj hloov ≤10%
Kev ruaj ntseg	Kub: 300 ° CLub sij hawm cua sov: 30min kuj hloov ≤300%