Ito iav rau emi shielding thiab touchscreens
Cov khoom Pics
ITO conductive coated iav yog tsim los ntawm kev sib kis ntawm silicon dioxide (SiO2) thiab indium tin oxide (feem ntau hu ua ITO) txheej los ntawm magnetron sputtering technology ntawm iav substrate nyob rau hauv tag nrho vacuumed mob, ua coated lub ntsej muag conductive, ITO yog ib tug hlau compound nrog zoo pob tshab thiab conductive zog.
Cov ntaub ntawv technical
ITO iav thickness | 0.4 hli, 0.5 hli, 0.55 hli, 0.7 hli, 1 hli, 1.1 hli, 2 hli, 3 hli, 4 hli | ||||||||
tsis kam | 3-5Ω | 7-10Ω | 12-18Ω | 20-30Ω | 30-50Ω | 50-80Ω | 60-120Ω | 100-200Ω | 200-500Ω |
txheej thickness | 2000-2200 Nws | 1600-1700 Nws | 1200-1300 Nws | 650-750 Ib | 350-450 Ib | 200-300 Nws | 150-250 Nws | 100-150 Ib | 30-100 Nws |
iav tsis kam | |||
Hom kev tiv thaiv | tsis muaj zog | ib txwm tsis kam | siab tsis kam |
Txhais | <60Ω | 60-150Ω | 150-500Ω |
Daim ntawv thov | Cov iav ua haujlwm siab feem ntau yog siv rau kev tiv thaiv electrostatic thiab kov npo ntau lawm | Ordinary kuj iav feem ntau yog siv rau TN hom kua siv lead ua zaub thiab hluav taws xob tiv thaiv kev cuam tshuam (EMI shielding) | Cov iav tsis tshua muaj siab yog feem ntau siv hauv STN kua siv lead ua cov lus qhia thiab pob tshab hauv pawg thawj coj saib |
Kev xeem ua haujlwm thiab kev ntsuas kev ntseeg siab | |
Ua siab ntev | ± 0.2 hli |
Warpage | tuab<0.55mm, warpage≤0.15% thickness>0.7 hli, warpage≤0.15% |
ZT ntsug | ≤1° |
Hardness | > 7 H |
Coating Abrasion Test | 0000 # steel wool nrog 1000gf,6000cycles, 40cycles / min |
Anti corrsion test (kev kuaj ntsev tsuag) | NaCL concentration 5%:Kub: 35 ° CLub sij hawm sim: 5min kuj hloov ≤10% |
Humidity resistance test | 60℃,90% RH,48 teev tsis kam hloov ≤10% |
Acid resistance test | HCL concentration: 6%, Kub: 35 ° CLub sij hawm sim: 5min kuj hloov ≤10% |
Alkali resistance test | NaOH concentration: 10%, Kub: 60 ° CLub sij hawm sim: 5min kuj hloov ≤10% |
Kev ruaj ntseg | Kub: 300 ° CLub sij hawm cua sov: 30min kuj hloov ≤300% |
Kev ua haujlwm
Si02 txheej:
(1) Lub luag haujlwm ntawm SiO2 txheej:
Lub hom phiaj tseem ceeb yog tiv thaiv cov hlau ions hauv cov dej qab zib-calcium substrate los ntawm diffusing rau hauv ITO txheej.Nws cuam tshuam cov conductivity ntawm ITO txheej.
(2) Zaj duab xis thickness ntawm SiO2 txheej:
Tus txheej txheem zaj duab xis thickness feem ntau yog 250 ± 50 Å
(3) Lwm yam khoom hauv SiO2 txheej:
Feem ntau, txhawm rau txhim kho kev xa tawm ntawm ITO iav, qee qhov kev faib ua feem ntawm SiN4 yog doped rau hauv SiO2.
GLASS RESISTANCE | ||||||
HOM | tsis muaj zog | ib txwm tsis kam | siab tsis kam | |||
Txhais | <60Ω | 60-150Ω | 150-500Ω | |||
Daim ntawv thov | Cov iav ua haujlwm siab feem ntau yog siv rau kev tiv thaiv electrostatic thiab kov npo ntau lawm | Ordinary kuj iav feem ntau yog siv rau TN hom kua siv lead ua zaub thiab hluav taws xob tiv thaiv kev cuam tshuam (EMI shielding) | Cov iav tsis tshua muaj siab yog feem ntau siv hauv STN kua siv lead ua cov lus qhia thiab pob tshab hauv pawg thawj coj saib |